An X-ray reflectivity study of the influence of anodic oxidation and annealing on interface structure in quantum well devices

Holt, Sabine; Brown, A S; Yuan, Shu

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An X-ray reflectivity study of the influence of anodic oxidation and annealing on interface structure in quantum well devices

Date

1999

Authors

Holt, Sabine

Brown, A S

Yuan, Shu

Publisher

Elsevier

URI

http://hdl.handle.net/1885/93760

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ANU Research Publications

Source

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Type

Journal article

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Cultural advice

An X-ray reflectivity study of the influence of anodic oxidation and annealing on interface structure in quantum well devices

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