Selective placement of quantum dots on nanoscale areas of metal-free substrates

Abstract

We demonstrate a novel approach for selectively immobiliz-ing semiconductor core-shell quantum dots directly on metal-free substrates with nanoscale resolution. This is accomplished by defining a mask via electron-beam lithography (EBL) followed by the functionalization of only the exposed areas of the substrate with quantum dots using a heterobi-functional linker. Non-specific binding is suppressed by a binding inhibitor. ( Show more