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Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma

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dc.contributor.authorThompson, Matt
dc.contributor.authorMagyar, Luke
dc.contributor.authorCorr, Cormac
dc.date.accessioned2020-10-28T23:25:43Z
dc.date.available2020-10-28T23:25:43Z
dc.date.issued2019
dc.date.updated2021-11-28T07:30:06Z
dc.description.abstractComplex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185°C to 336°C), while signifcant modifcation in silicon was only observed at 630°C. Nano-wire growth was observed in both germanium and silicon, and appears to be linked to the strength of the electric feld, which in turn determines the implantation energy of the helium ions. Nanostructure formation is proposed to be driven by surface adatom migration which is strongly infuenced by an Ehrlich-Schwoebel-type surface instability. The role of helium in this model is to drive germanium interstitial formation by ejecting germanium atoms from lattice sites, leading to germanium interstitial difusion towards the sample surface and subsequent adatom and surface nanostructure formation.
dc.format.mimetypeapplication/pdfen_AU
dc.identifier.issn2045-2322en_AU
dc.identifier.urihttp://hdl.handle.net/1885/213219
dc.language.isoen_AUen_AU
dc.provenanceThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. Te images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.en_AU
dc.publisherNature Publishing Group
dc.rights© The Author(s) 2019
dc.rights.licenseCreative Commons Attribution 4.0 International Licenseen_AU
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en_AU
dc.sourceScientific Reports
dc.titleNanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
dc.typeJournal article
dcterms.accessRightsOpen Accessen_AU
local.bibliographicCitation.issue10099en_AU
local.bibliographicCitation.lastpage9en_AU
local.bibliographicCitation.startpage1en_AU
local.contributor.affiliationThompson, Matt, College of Science, ANUen_AU
local.contributor.affiliationMagyar, Luke, College of Science, ANUen_AU
local.contributor.affiliationCorr, Cormac, College of Science, ANUen_AU
local.contributor.authoruidThompson, Matt, u5230533en_AU
local.contributor.authoruidMagyar, Luke, u5802436en_AU
local.contributor.authoruidCorr, Cormac, u4321701en_AU
local.description.notesImported from ARIESen_AU
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Dischargesen_AU
local.identifier.absseo859999 - Energy not elsewhere classifieden_AU
local.identifier.ariespublicationu3102795xPUB4720en_AU
local.identifier.citationvolume9en_AU
local.identifier.doi10.1038/s41598-019-46541-wen_AU
local.identifier.scopusID2-s2.0-85068978152
local.identifier.thomsonIDWOS:000475293200001
local.publisher.urlhttp://www.nature.com/srep/index.htmlen_AU
local.type.statusPublished Versionen_AU

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