Spatially resolved characterization of InGaAs/GaAs quantum dot structures by scanning spreading resistance microscopy
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Hakkarainen, T
Douhéret, O
Anand, S
Fu, Lan
Jagadish, C.
Tan, Hark Hoe
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American Institute of Physics
Abstract
Cross-sectional scanning spreading resistance microscopy (SSRM) is used to investigate stacked InGaAs/GaAs quantum dot(QD)structures with different doping schemes. Spatially resolved imaging of the QDs by SSRM is demonstrated. The SSRM contrast obtained for the QD layers is found to depend on doping in the structure. In the undoped structures both QD-layers and QDs within the layers could be resolved, while in the dopedstructures the QD layers appear more or less uniformly broadened. The origin of the SSRM contrast in the QD layer in the different samples is discussed and correlated with doping schemes.
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Applied Physics Letters
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