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Absorption enhancement due to scattering by dipoles into silicon waveguides

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dc.contributor.authorCatchpole, Kylie
dc.contributor.authorPillai, S.
dc.date.accessioned2015-11-12T00:12:58Z
dc.date.available2015-11-12T00:12:58Z
dc.date.issued2006-08-22
dc.date.updated2015-12-08T03:40:18Z
dc.description.abstractWe develop an optical model for absorption enhancement and diffuse reflectance by metal nanoparticles on a siliconwaveguide. A point dipole treatment is used, including the effects of the waveguide on both the angular emission spectrum and scattering cross section of the dipoles. The model agrees very well with our experimental results of greatly enhanced electroluminescence and photocurrent from silicon-on-insulator light-emitting diodes and also gives very good agreement with previously reported diffuse reflectance measurements. The results suggest that the main mechanism in the enhancement of diffuse reflectance in this system is a dramatic enhancement in the scattering cross section of waveguided light, rather than a waveguide-mediated dipole-dipole interaction. We also put lower bounds on the radiative efficiency of scattering by the nanoparticles.
dc.description.sponsorshipOne of the authors K.R.C. acknowledges the support of an Australian Research Council fellowship. The authors acknowledge the support of the Centre of Excellence for Advanced Silicon Photovoltaics and Photonics, supported by the Australian Research Council.en_AU
dc.identifier.issn0021-8979en_AU
dc.identifier.urihttp://hdl.handle.net/1885/16475
dc.provenancehttp://www.sherpa.ac.uk/romeo/issn/0021-8979..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 12/11/15).This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics and may be found at https://doi.org/10.1063/1.2226334
dc.publisherAmerican Institute of Physics (AIP)
dc.rights© 2006 American Institute of Physics.
dc.sourceJournal of Applied Physics
dc.subjectElectroluminescence
dc.subjectLight absorption
dc.subjectLight scattering
dc.subjectNanostructured materials
dc.subjectPhotocurrents
dc.subjectSemiconducting silicon
dc.subjectDiffuse reflectance measurements
dc.subjectDipole-dipole interaction
dc.subjectMetal nanoparticles
dc.subjectSilicon waveguides
dc.subjectOptical waveguides
dc.titleAbsorption enhancement due to scattering by dipoles into silicon waveguides
dc.typeJournal article
local.bibliographicCitation.issue4en_AU
local.bibliographicCitation.startpage044504en_AU
local.contributor.affiliationCatchpole, Kylie, College of Engineering and Computer Science, College of Engineering and Computer Science, Research School of Engineering, The Australian National Universityen_AU
local.contributor.affiliationPillai, Supriya, University of New South Wales, Australiaen_AU
local.contributor.authoruidu9612096en_AU
local.description.notesImported from ARIES. At the time of publication Catchpole was affiliated with School of Photovoltaic and Renewable Energy Engineering, University of New South Walesen_AU
local.identifier.absfor090605en_AU
local.identifier.ariespublicationu4133361xPUB48en_AU
local.identifier.citationvolume100en_AU
local.identifier.doi10.1063/1.2226334en_AU
local.identifier.scopusID2-s2.0-33748313399
local.publisher.urlhttps://www.aip.org/en_AU
local.type.statusPublished Versionen_AU

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