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Thin crystalline macroporous silicon solar cells with ion implanted emitter

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Date

2013

Authors

Ernst, Marco
Schulte-Huxel, Henning
Niepelt, Raphael
Kajari-Schroder, Sarah
Brendel, Rolf

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier

Abstract

We separate a (34 ± 2) μm-thick macroporous Si layer from an n-type Si wafer by means of electrochemical etching. The porosity is p = (26.2 ± 2.4)%. We use ion implantation to selectively dope the outer surfaces of the macroporous Si layer. No masking

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Keywords

Citation

URI

http://hdl.handle.net/1885/18418

Collections

ANU Research Publications

Source

Energy Procedia

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1016/j.egypro.2013.07.364

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