Resistive switching characteristics and mechanism of thermally grown WOx thin films

Date

Authors

Biju, Kuyyadi P.
Liu, Xinjun
Siddik, Manzar
Kim, Seonghyun
Shin, Jungho
Kim, Insung
Ignatiev, Alex
Hwang, Hyunsang

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Publisher

American Institute of Physics (AIP)

Abstract

Resistive switching characteristics of thermally oxidized tungsten thin films and their switching mechanism were investigated, modifying thickness of the active layer (WOx) by varying oxidation conditions. Two types of switching were observed in Pt/WOx/W

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Citation

Source

Journal of Applied Physics

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Restricted until

2037-12-31