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Bias-selective dual-operation-mode ultraviolet schottky-barrier photodetectors fabricated on high-resistivity homoepitaxial GaN

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Authors

Xie, Feng
Lu, Hai
Chen, Dunjun
Ren, Fang-Fang
Zhang, R.
Zheng, Youdou

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Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

We demonstrate a dual-operation-mode ultraviolet (UV) Schottky-barrier photodetector (PD) fabricated on high-resistivity GaN homoepitaxial layer with low defect density. The undoped GaN active layer is grown by metal-organic chemical vapor deposition on a conductive bulk GaN substrate. Under reverse and zero bias, the PD works in depletion mode with low dark current and high UV/visible rejection ratio. Under forward bias, the PD works alternatively in photoconductive mode, which exhibits high photo-responsivity and an attractive narrow detection band around 365 nm. In addition, the PD also shows reasonable response speed in both operation modes.

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IEEE Photonics Technology Letters

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Restricted until

2037-12-31