Electronic properties of (Ga,Mn)N thin films with high Mn content
| dc.contributor.author | Granville, S. | |
| dc.contributor.author | Ruck, B. J. | |
| dc.contributor.author | Preston, A. R. H. | |
| dc.contributor.author | Stewart, T. | |
| dc.contributor.author | Budde, F. | |
| dc.contributor.author | Trodahl, H. J. | |
| dc.contributor.author | Bittar, A. | |
| dc.contributor.author | Downes, J. E. | |
| dc.contributor.author | Ridgway, M. | |
| dc.date.accessioned | 2015-10-21T23:20:42Z | |
| dc.date.available | 2015-10-21T23:20:42Z | |
| dc.date.issued | 2008-11-19 | |
| dc.date.updated | 2016-02-24T10:00:19Z | |
| dc.description.abstract | Optical and dc resistivity measurements as well as x-ray spectroscopies have been performed on (Ga,Mn)N films containing Mn at up to 11 at. %. The results indicate that at higher Mn contents, the Fermi level is situated within extended states, while GaN host interband optical transitions are unaffected. The Mn state is confirmed to be 3d⁵, as in the case of lower Mn content films; however, the high Mn content merges the 3d levels into a band located just below the host conduction band. The Fermi level is located within these Mn states just below the conduction band, in sharp contrast to its midgap position in fully crystalline, low Mn concentration materials. The difference in the position of the Fermi level at high Mn dopant levels has important implications for the promotion of ferromagnetism in this material. | |
| dc.description.sponsorship | The authors gratefully acknowledge financial support from the New Zealand Foundation for Research Science and Technology through its New Economy Research Fund and through a postdoctoral fellowship of one of the authors B.J.R.. The work of the MacDiarmid Institute is supported by a New Zealand Centre of Research Excellence award. Another author S.G. wishes to thank Education New Zealand for financial support of the XANES measurements. | en_AU |
| dc.format | 5 pages | |
| dc.identifier.issn | 0021-8979 | en_AU |
| dc.identifier.uri | http://hdl.handle.net/1885/16015 | |
| dc.publisher | American Institute of Physics (AIP) | |
| dc.rights | http://www.sherpa.ac.uk/romeo/issn/0021-8979..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 22/10/15). Copyright 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics and may be found at https://doi.org/10.1063/1.3020536 | |
| dc.source | Journal of Applied Physics | |
| dc.subject | Keywords: Conduction bands; Electric conductivity; Electric currents; Electron mobility; Electronic properties; Fermi level; Fermions; Gallium nitride; Heat conduction; Manganese; Semiconducting gallium; Thick films; Three dimensional; Dc resistivities; Dopant leve | |
| dc.title | Electronic properties of (Ga,Mn)N thin films with high Mn content | |
| dc.type | Journal article | |
| local.bibliographicCitation.issue | 10 | en_AU |
| local.bibliographicCitation.lastpage | 5 | |
| local.bibliographicCitation.startpage | 103710 | en_AU |
| local.contributor.affiliation | Granville, S, Victoria University of Wellington, New Zealand | en_AU |
| local.contributor.affiliation | Ruck, B J , Victoria University of Wellington , New Zealand | en_AU |
| local.contributor.affiliation | Preston, A R H, Victoria University of Wellington, New Zealand | en_AU |
| local.contributor.affiliation | Stewart, T, Victoria University of Wellington, New Zealand | en_AU |
| local.contributor.affiliation | Budde, F, Victoria University of Wellington, New Zealand | en_AU |
| local.contributor.affiliation | Trodahl , H J , Victoria University of Wellington, New Zealand | en_AU |
| local.contributor.affiliation | Bittar, A , Industrial Research Ltd , New Zealand | en_AU |
| local.contributor.affiliation | Downes, J E, Macquarie University, Australia | en_AU |
| local.contributor.affiliation | Ridgway, Mark C, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National University | en_AU |
| local.contributor.authoruid | Ridgway, Mark C, u9001886 | |
| local.description.notes | Imported from ARIES | en_AU |
| local.identifier.absfor | 020499 | en_AU |
| local.identifier.ariespublication | u3488905xPUB176 | en_AU |
| local.identifier.citationvolume | 104 | en_AU |
| local.identifier.doi | 10.1063/1.3020536 | en_AU |
| local.identifier.scopusID | 2-s2.0-57049128197 | |
| local.identifier.thomsonID | 000262605800076 | |
| local.publisher.url | https://www.aip.org/ | en_AU |
| local.type.status | Published Version | en_AU |