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Bistable Resistive Switching in Hafnium-Silicate Thin Films

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Authors

Nawaz (Saleh), Muhammad
Venkatachalam, Dinesh
Belay, Kidane
Kim, Tae-Hyun
Elliman, Robert

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Volume Title

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Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

We report on the resistive switching mechanism of dc magnetron sputtered hafnium-silicates (HfxSi1-xO2) memory thin films. It is observed that the electroforming of these films depends on the thickness and stoichiometry of the insulator as well as on the

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Source

2010 conference on Optoelectronic and Microelectronic Materials and Devices Proceedings

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Restricted until

2037-12-31