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Helicon plasma with additional immersed antenna

dc.contributor.authorAanesland, Ane
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Roderick
dc.contributor.authorFrederiksen, Ashild
dc.date.accessioned2015-12-13T22:50:54Z
dc.date.available2015-12-13T22:50:54Z
dc.date.issued2004
dc.date.updated2023-10-01T07:16:16Z
dc.description.abstractA 'primary' RF power (H-power) at 13.56 MHz is coupled to a plasma source excited by an external double saddle field Helicon antenna. A 'secondary' RF power (S-power), also at 13.56 MHz but with variable phase, is additionally coupled by inserting a second antenna in contact with the plasma through one end of the source. The immersed antenna can be grounded or floating, allowing a self-bias to form in the latter case. Changes in the plasma density and electron temperature are measured in both cases with varying power on the immersed antenna. The plasma potential increases dramatically with S-power in the grounded case, and is found to be similar in size to the sum of the plasma potential and the self-bias formed in the floating case for all powers. Hence, the sheath between the immersed antenna and the plasma is shown to be equal in both the grounded and floating cases. Although the power efficiency does not vary significantly as a function of the S-power, it is consistently lower for the grounded case possibly as a result of a dc current to ground. The plasma parameters are drastically changed as the phase between the two antennae are varied (floating case), and a sinusoidal function was fitted to the plasma parameters as a function of the phase shift. The calculated power loss to the antenna indicates that the power efficiency of the immersed antenna, as the phase is changed, is altered from 80% to 10%.
dc.identifier.issn0022-3727
dc.identifier.urihttp://hdl.handle.net/1885/81015
dc.publisherInstitute of Physics Publishing
dc.sourceJournal of Physics D: Applied Physics
dc.subjectKeywords: Antennas; Dielectric materials; Etching; Glass; Helicons; Inductively coupled plasma; Magnetic field effects; Phase shift; Plasma density; Etch insulators; Helicon plasmas; Ion energies; Plasma potentials; Plasma theory
dc.titleHelicon plasma with additional immersed antenna
dc.typeJournal article
local.bibliographicCitation.issue9
local.bibliographicCitation.lastpage41
local.bibliographicCitation.startpage1334
local.contributor.affiliationAanesland, Ane, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationFrederiksen, Ashild, University of Tromso
local.contributor.authoruidAanesland, Ane, u4162172
local.contributor.authoruidCharles, Christine, u4025692
local.contributor.authoruidBoswell, Roderick, u8000743
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub9328
local.identifier.citationvolume37
local.identifier.doi10.1088/0022-3727/37/9/006
local.identifier.scopusID2-s2.0-2442433837
local.identifier.thomsonID000221709100008
local.type.statusPublished Version

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