Correlating properties of PECVD SiNx layers to deposition parameters
Loading...
Date
Authors
Vora, Kaushal
Belay, Kidane
Pyke, Daniel
Karouta, Fouad
Jagadish, Chennupati
Journal Title
Journal ISSN
Volume Title
Publisher
IEEE
Abstract
We present a comprehensive study of the properties of SiNx layers deposited by PECVD correlating refractive index, mechanical stress, deposition rate, N/Si ratio, H-incorporation as function of the deposition parameters such SiH4 flow, RF power, LF/HF powers ratio and deposition temperature.
Description
Citation
Collections
Source
Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
Type
Book Title
Entity type
Access Statement
License Rights
Restricted until
2037-12-31
Downloads
File
Description