Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning
dc.contributor.author | Ruffell, Simon | |
dc.contributor.author | Venkatachalam, Dinesh | |
dc.contributor.author | Shalav, Avi | |
dc.contributor.author | Elliman, Robert | |
dc.coverage.spatial | Boston USA | |
dc.date.accessioned | 2015-12-07T22:17:10Z | |
dc.date.created | November 30-December 4 2009 | |
dc.date.issued | 2010 | |
dc.date.updated | 2016-02-24T11:11:41Z | |
dc.description.abstract | Ordered arrays of gold particles have been fabricated on gold-coated Si(100) surfaces by pre-patterning the surface with a nanoindenter. During thermal annealing the Au is observed to accumulate within the residual indents. Once nucleated, the Au particles grow at the expense of smaller surface particles via an Ostwald-ripening process. The size of the Au particles is controlled by the initial thickness of the deposited Au layer, the size of the indentation (which is controlled with a high degree of precision), and the annealing conditions. Particles of ∼200 nm dimensions are formed in indents of ∼1 μm dimensions whilst nanoparticles of ∼20 nm are observed in the smallest indents made (∼50 nm). We have also demonstrated patterning of Au by indentation of a Au layer sandwiched between two SiO2 films deposited on Si by plasma-enhanced chemical vapour deposition. Here, cracking of the SiO2 layer occurs allowing Au to diffuse to the surface at the indented locations during post-indentation annealing. | |
dc.identifier.uri | http://hdl.handle.net/1885/18412 | |
dc.publisher | Materials Research Society | |
dc.relation.ispartofseries | Materials Research Society Meeting Fall 2009 | |
dc.source | Materials Research Society Symposium Proceedings Volume 1228 | |
dc.source.uri | http://www.mrs.org/s_mrs/sec.asp?CID=9546&DID=198609&css=print | |
dc.source.uri | http://www.mrs.org/s_mr/sec_subscribe.asp?CID=24667&DID=271684 | |
dc.subject | Keywords: Annealing condition; Au particles; Degree of precision; Gold particles; Gold-coated; Initial thickness; Nanoindenters; Ordered array; Plasma-enhanced chemical vapour depositions; Pre-patterning; Residual indent; Ripening process; Si(100) surface; Silicon | |
dc.title | Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning | |
dc.type | Conference paper | |
local.bibliographicCitation.startpage | 6 | |
local.contributor.affiliation | Ruffell, Simon, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Venkatachalam, Dinesh, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Shalav, Avi, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Elliman, Robert, College of Physical and Mathematical Sciences, ANU | |
local.contributor.authoremail | u4575027@anu.edu.au | |
local.contributor.authoruid | Ruffell, Simon, u4241699 | |
local.contributor.authoruid | Venkatachalam, Dinesh, u4575027 | |
local.contributor.authoruid | Shalav, Avi, u4479768 | |
local.contributor.authoruid | Elliman, Robert, u9012877 | |
local.description.notes | Imported from ARIES | |
local.description.refereed | Yes | |
local.identifier.absfor | 020499 - Condensed Matter Physics not elsewhere classified | |
local.identifier.absfor | 091205 - Functional Materials | |
local.identifier.ariespublication | u4575027xPUB4 | |
local.identifier.scopusID | 2-s2.0-77957762126 | |
local.identifier.uidSubmittedBy | u4575027 | |
local.type.status | Published Version |