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Characterization of ion track morphology formed by swift heavy ion irradiation in silicon oxynitride films

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Authors

Santiago, Pablo
Schauries, Daniel
Nadzri, Allina
Vora, Kaushal
Ridgway, Mark C
Kluth, Patrick

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EDP Sciences

Abstract

Amorphous silicon oxynitride (SiO<inf>x</inf>N<inf>y</inf>) possess interesting optical and mechanical properties. Here, we present direct evidence for the formation of ion tracks in 1 μm thick silicon oxynitride of different stoichiometries. The tracks were created by irradiation with 185 MeV Au13+ ions. The samples were studied using spectral reflectometry and Rutherford backscattering spectrometry (RBS), with the track morphology characterised by means of small angle X-ray scattering (SAXS). The radial density of the ion tracks resembles a core-shell structure with a typical radius of ∼ 1.8 + 2.4 nm in the case of Si<inf>3</inf>N<inf>4</inf> and 2.3 + 3.2 nm for SiO<inf>2</inf>.

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EPJ Web of Conferences

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Open Access

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