Self-limited underdense microplasmas in bulk silicon induced by ultrashort laser pulses
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Mouskeftaras, Alexandros
Rode, Andrei V.
Clady, Raphaël
Sentis, Marc
Utéza, Olivier
Grojo, David
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American Institute of Physics
Abstract
Two-photon ionization by focused femtosecond laser pulses initiates the development of
micrometer-scale plasmas in the bulk of silicon. Using pump-and-probe transmission microscopy
with infrared light, we investigate the space-time characteristics of these plasmas for laser intensities
up to 10¹²W/cm². The measurements reveal a self-limitation of the excitation at a maximum
free-carrier density of ffi1019 cm3, which is more than one order of magnitude below the threshold
for permanent modification. The plasmas remain unchanged in the 100 ps timescale revealing
slow carrier kinetics. The results underline the limits in local control of silicon dielectric permittivity,
which are inherent to the use of single near-infrared ultrashort Gaussian pulses.
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Applied Physics Letters