Formation characteristics and photoluminescence of Ge nanocrystals in HfO[sub 2]

Abstract

Genanocrystals (NCs) are shown to form within HfO₂ at relatively low annealing temperatures (600–700 °C) and to exhibit characteristic photoluminescence(PL) emission consistent with quantum confinement effects. After annealing at 600 °C, sample implanted with 8.4×10¹⁵ Ge cm⁻² show two major PL peaks, at 0.94 and 0.88 eV, which are attributed to no-phonon and transverse-optical phonon replica of Ge NCs, respectively. The intensity reaches a maximum for annealing temperatures around 700 °C and decreases at higher temperatures as the NC size continues to increase. The no-phonon emission also undergoes a significant redshift for temperatures above 800 °C. For fluences in the range from 8.4×1015 to 2.5×10¹⁶ cm⁻², the average NC size increases from ∼13.5±2.6 to ∼20.0±3.7 nm. These NC sizes are much larger than within amorphous SiO₂. Implanted Ge is shown to form Ge NCs within the matrix of monoclinic (m)-HfO₂ during thermal annealing with the orientation relationship of [101]m-HfO₂//[110]Ge NC.