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Plasma Ionization in Low-Pressure Radio-Frequency Discharges - Part I: Optical Measurements

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dc.contributor.authorO'Connell, D
dc.contributor.authorGans, T
dc.contributor.authorMeige, A
dc.contributor.authorAwakowicz, Peter
dc.contributor.authorBoswell, Roderick
dc.date.accessioned2015-12-07T22:42:35Z
dc.date.available2015-12-07T22:42:35Z
dc.date.issued2008
dc.date.updated2015-12-07T11:09:45Z
dc.description.abstractThe electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled plasma is investigated using phase-resolved optical emission spectroscopy. Plasma ionization and sustainment mechanisms are governed by the expanding and contracting sheath and complex wave-particle interactions. Electrons are energized through the advancing and retreating electric field of the RF sheath. The associated interaction of energetic sheath electrons with thermal bulk plasma electrons drives a two-stream instability also dissipating power in the plasma.
dc.identifier.issn0093-3813
dc.identifier.urihttp://hdl.handle.net/1885/24609
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE Inc)
dc.sourceIEEE Transactions on Plasma Science
dc.subjectKeywords: Atomic spectroscopy; Atoms; Chlorine compounds; Electric discharges; Electric fields; Electromagnetic field theory; Electromagnetic fields; Electrons; Emission spectroscopy; Flow interactions; Inductively coupled plasma; Inert gases; Integrated optoelectr Capacitively coupled plasmas; Discharges; Electric field reversal; Electric fields; Electrodes; Heating; Ionization; Phase resolved optical emission spectroscopy; Plasma diagnostics; Plasma ionization; Plasmas; Radio frequency; Radio-frequency plasmas; Wa
dc.titlePlasma Ionization in Low-Pressure Radio-Frequency Discharges - Part I: Optical Measurements
dc.typeJournal article
local.bibliographicCitation.issue4
local.bibliographicCitation.lastpage1383
local.bibliographicCitation.startpage1382
local.contributor.affiliationO'Connell, D, Ruhr-University Bochum
local.contributor.affiliationGans, T, Ruhr-University Bochum
local.contributor.affiliationMeige, A, Laboratoire de Physique et Technologie des Plasmas, Ecole Polytechnique
local.contributor.affiliationAwakowicz, Peter, Ruhr-Universitat Bochum
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidBoswell, Roderick, u8000743
local.description.notesImported from ARIES
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationu4515298xPUB33
local.identifier.citationvolume36
local.identifier.doi10.1109/TPS.2008.927348
local.identifier.scopusID2-s2.0-50249141305
local.identifier.thomsonID000258618200261
local.type.statusPublished Version

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