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Stoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications

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Date

2008

Authors

Vu, Khu
Madden, Steve
Luther-Davies, Barry
Bulla, Douglas

Journal Title

Journal ISSN

Volume Title

Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

Description

Keywords

Keywords: Fibers; Optical fibers; Optical materials; Oxide films; Tellurium; Tellurium compounds; Thick films; 1550 nm; As deposited; Low losses; Photonic applications; Propagation losses; Rf-sputtering; Tellurium oxides; Optical films

Citation

URI

http://hdl.handle.net/1885/52530

Collections

ANU Research Publications

Source

Proceedings of OECC/ACOFT 2008

Type

Conference paper

Book Title

Entity type

Access Statement

License Rights

DOI

10.1109/OECCACOFT.2008.4610455

Restricted until

2037-12-31

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01_Vu_Stoichiometric_Low_Loss_2008.pdf (137.05 KB)

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