Stoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications
Date
2008
Authors
Vu, Khu
Madden, Steve
Luther-Davies, Barry
Bulla, Douglas
Journal Title
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Volume Title
Publisher
Institute of Electrical and Electronics Engineers (IEEE Inc)
Abstract
Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.
Description
Keywords
Keywords: Fibers; Optical fibers; Optical materials; Oxide films; Tellurium; Tellurium compounds; Thick films; 1550 nm; As deposited; Low losses; Photonic applications; Propagation losses; Rf-sputtering; Tellurium oxides; Optical films
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Source
Proceedings of OECC/ACOFT 2008
Type
Conference paper
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Restricted until
2037-12-31
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