EXAFS study of the structural properties of In and In + C implanted Ge

Date

2016

Authors

Feng, Ruixing
Kremer, Felipe
Sprouster, D. J.
Mirzaei, Sahar
Decoster, Stefan
Glover, C J
Medling, Scott
Russo, Salvy P
Ridgway, Mark

Journal Title

Journal ISSN

Volume Title

Publisher

IOP Publishing

Abstract

The structural configurations of In implanted Ge have been studied via x-ray absorption spectroscopy with and without the codoping of C. In the case of In singly implanted Ge, while the In atoms occupy an substitutional site in Ge (InGe4) at low In concentration (≤0.2 at. %), they precipitate into a metallic phase (In metal) and form complexes composed of one vacancy and three Ge atoms (InVGe3) at concentration ≥ 0.6 at. %. This behaviour can be suppressed by the addition of C leading to In-C pairing to form InCGe3 complexes. This cluster enables In atoms to recover a four-fold coordinated structure and has the potential to improve the electrical activation of In atoms in Ge.

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Citation

Source

Journal of Physics: Conference Series

Type

Conference paper

Book Title

Entity type

Access Statement

Open Access

License Rights

Creative Commons Attribution 3.0 licence

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