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The Application and Limitations of PECVD for Silicon-based Photonics

dc.contributor.authorSpooner, Marcen_US
dc.date.accessioned2009-08-18T00:14:10Zen_US
dc.date.accessioned2011-01-04T02:36:28Z
dc.date.available2009-08-18T00:14:10Zen_US
dc.date.available2011-01-04T02:36:28Z
dc.date.issued2005
dc.description.abstractThis thesis presents results on the applications and limitations of plasma enhanced chemical vapour deposition for silicon-based photonics, with an emphasis on optical microcavities for the control of light emission from silicon nanocrystals. ¶ ...en_US
dc.identifier.otherb22787422
dc.identifier.urihttp://hdl.handle.net/1885/48197
dc.language.isoenen_US
dc.rights.uriThe Australian National Universityen_US
dc.subjectsilicon photonicsen_US
dc.subjectnanocrystalsen_US
dc.subjectPECVDen_US
dc.subjectcracksen_US
dc.titleThe Application and Limitations of PECVD for Silicon-based Photonicsen_US
dc.typeThesis (PhD)en_US
dcterms.valid2006en_US
local.contributor.affiliationResearch School of Physical Sciences and Engineering, Electronic Materials Engineeringen_US
local.contributor.affiliationThe Australian National Universityen_US
local.description.refereedyesen_US
local.identifier.doi10.25911/5d7a2bb70d9fb
local.mintdoimint
local.type.degreeDoctor of Philosophy (PhD)en_US

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