Cultural advice

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.

Aboriginal and Torres Strait Islander peoples are advised that ANU Library collections may include images, names, voices, and other representations of deceased persons.

Material in the collection may contain terms, language or views that reflect the period in which the item was created and may be considered inappropriate today.

Structural characterization of Ge nanocrystals in silica amorphised by ion irradiation

Date

Authors

Araujo, Leandro

Giulian, Raquel

Johannessen, Bernt

Llewellyn, David

Kluth, Patrick

Azevedo, G de M

Cookson, D J

Ridgway, Mark C

Publisher

Elsevier

Abstract

Ge nanocrystals (NCs) grown by ion implantation in amorphous silica matrices were irradiated with 5 MeV Si ions over a different fluence range (2 × 1011-2 × 1013 cm-2) than previously reported. Size and depth distributions as well as structural disorder

Keywords

Keywords: Amorphization; Extended X ray absorption fine structure spectroscopy; Germanium; Ion bombardment; Silica; Transmission electron microscopy; Depth distributions; Structural disorder; Nanocrystals Amorphisation; EXAFS; Ge; Ion implantation; Irradiation; Nanocrystals; SAXS; TEM

URI

http://hdl.handle.net/1885/32631

Collections

ANU Research Publications

Source

Nuclear Instruments and Methods in Physics Research: Section A

Type

Journal article

DOI

10.1016/j.nimb.2008.03.175

Restricted until

2037-12-31

Downloads

File

Description

01_Araujo_Structural_characterization_of_2008.pdf (406.48 KB)