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On the Angular Dependence of Profile Broadening in Silicon Under Oxygen and Nitrogen Bombardment

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dc.contributor.authorPetravic, Mladen
dc.contributor.authorDeenapanray, Prakash
dc.contributor.authorDemangel, Caroline
dc.contributor.authorMoon, D-S
dc.coverage.spatialBrussels Belgium
dc.date.accessioned2015-12-08T22:21:20Z
dc.date.available2015-12-08T22:21:20Z
dc.date.createdMay 9 1999
dc.date.issued2000
dc.date.updated2015-12-08T08:34:39Z
dc.identifier.isbn0444503234
dc.identifier.urihttp://hdl.handle.net/1885/32108
dc.publisherElsevier
dc.relation.ispartofseriesSecondary Ion Mass Spectrometry (SIMS 1999)
dc.sourceProceedings of the 12th International Conference on Secondary Ion Mass Spetrometry
dc.titleOn the Angular Dependence of Profile Broadening in Silicon Under Oxygen and Nitrogen Bombardment
dc.typeConference paper
local.bibliographicCitation.lastpage548
local.bibliographicCitation.startpage545
local.contributor.affiliationPetravic, Mladen, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationDeenapanray, Prakash, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationDemangel, Caroline, CNRS
local.contributor.affiliationMoon, D-S, California Institute of Technology
local.contributor.authoruidPetravic, Mladen, u8905251
local.contributor.authoruidDeenapanray, Prakash, u4018937
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub89
local.type.statusPublished Version

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