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Capacitive effects in quasi-steady-state voltage and lifetime measurements of silicon devices

dc.contributor.authorCuevas, Andres
dc.contributor.authorRecart, F
dc.date.accessioned2010-09-21T04:45:51Zen_US
dc.date.accessioned2010-12-20T06:05:50Z
dc.date.available2010-09-21T04:45:51Zen_US
dc.date.available2010-12-20T06:05:50Z
dc.date.issued2005-10-11en_US
dc.date.updated2015-12-11T10:26:13Z
dc.description.abstractWhen measuring I-V characteristics and carrier lifetimes in quasi-steady-state QSS conditions, it is important to consider the time dependence of the charge due to excess carriers within the device. This paper shows that the space-charge region present in pn-junction devices and in many lifetime test structures can produce a significant capacitive effect when measuring the low voltage and low carrier density range of QSS I-V curves. Both computer modeling and experiments show that the junction capacitance is particularly significant in the case of low-resistivity silicon wafers, but it can also be noticeable in intermediate and high-resistivity samples. The paper demonstrates that the static I-V characteristics can be accurately reconstructed using a simple analytical model for the space-charge region. It thus fills a gap in the understanding of the low injection range of QSS voltage and lifetime measurements.
dc.format7 pages
dc.identifier.citationJournal of Applied Physics 98.7 (2005): 074507/1-7
dc.identifier.issn0021-8979en_US
dc.identifier.issn1089-7550en_US
dc.identifier.urihttp://hdl.handle.net/10440/1104en_US
dc.identifier.urihttp://digitalcollections.anu.edu.au/handle/10440/1104
dc.publisherAmerican Institute of Physics
dc.rightshttp://www.sherpa.ac.uk/romeo/index.php "Author can archive pre-print (ie pre-refereeing) … post-print (ie final draft post-refereeing) … [and] publisher's version/PDF. Link to publisher version … [and] Copyright notice required. Publisher's version/PDF can be used on … employers web site. " - from SHERPA/RoMEO site (as at 25/02/10) © 2005 The American Institute of Physics. "This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics." - from publisher web site (as at 04/05/10)
dc.sourceJournal of Applied Physics
dc.source.urihttp://link.aip.org/link/JAPIAU/v98/i7/p074507/s1en_US
dc.subjectsilicon
dc.subjectelemental semiconductors
dc.subjectsemiconductor device measurement
dc.subjectcarrier lifetime
dc.subjectspace charge
dc.subjectp-n junctions
dc.subjectcapacitance
dc.subjectcarrier density
dc.subjectelectrical resistivity
dc.titleCapacitive effects in quasi-steady-state voltage and lifetime measurements of silicon devices
dc.typeJournal article
dcterms.dateAccepted2005-06-17en_US
local.bibliographicCitation.issue7
local.bibliographicCitation.lastpage7
local.bibliographicCitation.startpage1
local.contributor.affiliationCuevas, Andres, College of Engineering and Computer Science, ANU
local.contributor.affiliationRecart, F, Euskal Herriko Unibertsitatea
local.contributor.authoruidu9308750en_US
local.contributor.authoruidE16151en_US
local.description.refereedYes
local.identifier.absfor090699en_US
local.identifier.ariespublicationMigratedxPub8380en_US
local.identifier.citationvolume98
local.identifier.doi10.1063/1.2073973
local.identifier.scopusID2-s2.0-27144446666
local.publisher.urlhttp://www.aip.org/en_US
local.type.statusPublished Versionen_US

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