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Ga Cleaning of Al2O3 Substrate: Low Coverage Adsorption of Ga on a Hydrogen-Contaminated &alpha-Al2O3(0001) Surface

Date

Authors

Yang, Rui

Rendell, Alistair

Publisher

American Chemical Society

Abstract

The low coverage adsorption of gallium on a hydrogen-contaminated Al-terminated α-Al2O3(0001) surface is studied theoretically using first-principles density functional calculations with periodic boundary conditions. Initial computations to form the hydr

Keywords

Keywords: Adsorption; Boundary conditions; Chemical cleaning; Contamination; Density functional theory; Gallium; Hydrogen; Physisorbed hydrogen; Surface adhesion; Alumina

URI

http://hdl.handle.net/1885/35834

Collections

ANU Research Publications

Source

Journal of Physical Chemistry C

Type

Journal article

DOI

10.1021/jp063931r

Restricted until

2037-12-31

Downloads

File

Description

01_Yang_Ga_Cleaning_of_Al2O3_2007.pdf (890.92 KB)

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