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Silicon Surface Passivation by Sputtered Aluminium Oxide: Influence of Annealing Temperature and Ambient Gas

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dc.contributor.authorZhang, Xinyu
dc.contributor.authorThomson, Andrew
dc.contributor.authorCuevas, Andres
dc.date.accessioned2015-12-08T22:18:04Z
dc.date.issued2014
dc.date.updated2015-12-08T08:12:45Z
dc.description.abstractAluminium oxide (AlOx) films have achieved excellent passivation on crystalline-silicon surfaces. Irrespective of the deposition method, an anneal is required to activate the passivation. In this work, the reaction kinetics of the annealing process for radiofrequency reactively-sputtered AlOx is investigated. The effectiveness of the activation anneal critically depend on the ambient gas. A gas mixture of N2 and H2 is found to be the best annealing ambient for sputtered Al2O3 films, leading to an effective surface recombination velocity Seff of ∼5 cm/s. The experiments indicate that the surface passivation anneal follows an activation energy EA close to 1.1 eV.
dc.identifier.issn2162-8742
dc.identifier.urihttp://hdl.handle.net/1885/31176
dc.publisherElectrochemical Society, Inc.
dc.sourceECS Solid State Letters
dc.titleSilicon Surface Passivation by Sputtered Aluminium Oxide: Influence of Annealing Temperature and Ambient Gas
dc.typeJournal article
local.bibliographicCitation.issue11
local.bibliographicCitation.lastpageN39
local.bibliographicCitation.startpageN37
local.contributor.affiliationZhang, Xinyu, College of Engineering and Computer Science, ANU
local.contributor.affiliationThomson, Andrew, College of Engineering and Computer Science, ANU
local.contributor.affiliationCuevas, Andres, College of Engineering and Computer Science, ANU
local.contributor.authoruidZhang, Xinyu, u5033752
local.contributor.authoruidThomson, Andrew, u4323527
local.contributor.authoruidCuevas, Andres, u9308750
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.identifier.absfor090605 - Photodetectors, Optical Sensors and Solar Cells
local.identifier.absseo850504 - Solar-Photovoltaic Energy
local.identifier.ariespublicationU5431022xPUB80
local.identifier.citationvolume3
local.identifier.doi10.1149/2.0021412ssl
local.identifier.scopusID2-s2.0-84924052386
local.identifier.thomsonID000343251200002
local.type.statusPublished Version

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