Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation
Date
2000
Authors
Canning, J
Aslund, Mathias
Ankiewicz, Adrian
Dainese, M
Fernando, R
Sahu, J
Wosinski, L
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Volume Title
Publisher
Optical Society of America
Abstract
Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.
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Keywords
Keywords: Stress anisotropy; Anisotropy; Compressive stress; Plasma enhanced chemical vapor deposition; Ultraviolet radiation; Birefringence
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Source
Applied Optics
Type
Journal article
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DOI
Restricted until
2037-12-31
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