Ultrafast Ablation with High-Pulse-Rate Lasers. Part I: Theoretical Considerations

Date

1999

Authors

Gamaly, Eugene G
Rode, Andrei V
Luther-Davies, Barry

Journal Title

Journal ISSN

Volume Title

Publisher

American Institute of Physics (AIP)

Abstract

A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.

Description

Keywords

Keywords: Amorphous films; Deposition; Evaporation; Film growth; Heat conduction; Laser pulses; Light absorption; Pulsed laser applications; Thin films; Ultrafast phenomena; Pulsed laser deposition (PLD); Laser ablation

Citation

Source

Journal of Applied Physics

Type

Journal article

Book Title

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