Ultrafast Ablation with High-Pulse-Rate Lasers. Part I: Theoretical Considerations
Date
1999
Authors
Gamaly, Eugene G
Rode, Andrei V
Luther-Davies, Barry
Journal Title
Journal ISSN
Volume Title
Publisher
American Institute of Physics (AIP)
Abstract
A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.
Description
Keywords
Keywords: Amorphous films; Deposition; Evaporation; Film growth; Heat conduction; Laser pulses; Light absorption; Pulsed laser applications; Thin films; Ultrafast phenomena; Pulsed laser deposition (PLD); Laser ablation
Citation
Collections
Source
Journal of Applied Physics
Type
Journal article