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Improvements In Reactive Ion Etching Apparatus

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dc.contributor.authorBoswell, Roderick Williamen_AU
dc.date.accessioned2019-04-05T00:27:56Z
dc.date.available2019-04-05T00:27:56Z
dc.date.created12/08/1987en_AU
dc.date.submitted13/08/1986en_AU
dc.identifier.govdoc1987078093en_AU
dc.identifier.patentPCT/AU1987/000261en_AU
dc.identifier.patentWO1988/001435en_AU
dc.identifier.urihttp://hdl.handle.net/1885/158833
dc.publisherIP Australiaen_AU
dc.rights.holderThe Australian National Universityen_AU
dc.source.urihttp://pericles.ipaustralia.gov.au/ols/auspat/applicationDetails.do?applicationNo=1987078093en_AU
dc.subject.ipcH01L21/302en_AU
dc.titleImprovements In Reactive Ion Etching Apparatusen_AU
dc.typePatenten_AU
dcterms.accessRightsOpen Access via publisher website
local.publisher.urlhttps://www.ipaustralia.gov.au/en_AU
local.type.statusMetadata onlyen_AU

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