Improvements In Reactive Ion Etching Apparatus
dc.contributor.author | Boswell, Roderick William | en_AU |
dc.date.accessioned | 2019-04-05T00:27:56Z | |
dc.date.available | 2019-04-05T00:27:56Z | |
dc.date.created | 12/08/1987 | en_AU |
dc.date.submitted | 13/08/1986 | en_AU |
dc.identifier.govdoc | 1987078093 | en_AU |
dc.identifier.patent | PCT/AU1987/000261 | en_AU |
dc.identifier.patent | WO1988/001435 | en_AU |
dc.identifier.uri | http://hdl.handle.net/1885/158833 | |
dc.publisher | IP Australia | en_AU |
dc.rights.holder | The Australian National University | en_AU |
dc.source.uri | http://pericles.ipaustralia.gov.au/ols/auspat/applicationDetails.do?applicationNo=1987078093 | en_AU |
dc.subject.ipc | H01L21/302 | en_AU |
dc.title | Improvements In Reactive Ion Etching Apparatus | en_AU |
dc.type | Patent | en_AU |
dcterms.accessRights | Open Access via publisher website | |
local.contributor.authoremail | repository.admin@anu.edu.au | en_AU |
local.identifier.uidSubmittedBy | u1027010 | en_AU |
local.publisher.url | https://www.ipaustralia.gov.au/ | en_AU |
local.type.status | Metadata only | en_AU |