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Hydrogen Softening and Optical Transparency in Si-incorporated Hyrogenated Amorphous Carbon Films

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Authors

Abbas, G. A.
Papakonstantinou, P.
McLaughlin, J. A.
Dall (previously Weijers), Tessica
Elliman, Robert
Filik, J.

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American Institute of Physics (AIP)

Abstract

High-resolution x-ray reflectivity (XRR) and heavy-ion elastic recoil detection were employed to study the role of hydrogen on the softening behavior observed in Si-incorporated hydrogenated amorphous carbon (Si-a-C:H) films synthesized by plasma-enhanced chemical-vapor deposition using tetramethylsilane (TMS) precursor in C2 H2 Ar plasma. An enhancement of the optical band gap and a massive reduction in the density of the films prepared at high TMS flow rate were revealed, respectively, by spectroscopic ellipsometry and XRR analysis with the development of a double critical angle. A hydrogenation process was responsible for a rise in the density of voids and an associated reduction in the connectivity of the carbon network and the release of its residual stress.

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Journal of Applied Physics

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Restricted until

2037-12-31