Unexpected Benefits of Rapid Growth Rate for III-V Nanowires
Loading...
Date
Authors
Joyce, Hannah J
Gao, Qiang
Jagadish, Chennupati
Kim, Yong
Fickenscher, M A
Perera, S
Hoang, Thang B
Smith, Leigh M
Jackson, Howard E
Yarrison-Rice, Jan M
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society
Abstract
In conventional planar growth of bulk III-V materials, a slow growth rate favors high crystallographlc quality, optical quality, and purity of the resulting material. Surprisingly, we observe exactly the opposite effect for Au-assisted GaAs nanowlre growth. By employing a rapid growth rate, the resulting nanowires are markedly less tapered, are free of planar crystallographlc defects, and have very high purity with minimal Intrinsic dopant Incorporation. Importantly, carrier lifetimes are not adversely affected. These results reveal Intriguing behavior In the growth of nanoscale materials, and represent a significant advance toward the rational growth of nanowires for device applications.
Description
Citation
Collections
Source
Nano Letters
Type
Book Title
Entity type
Access Statement
License Rights
Restricted until
2037-12-31
Downloads
File
Description