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Electron energy probability function and L-p similarity in low pressure inductively coupled bounded plasma

dc.contributor.authorChatterjee, Sanghamitro
dc.contributor.authorBhattacharjee, Sudeep
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Rod
dc.date.accessioned2016-02-08T04:41:34Z
dc.date.available2016-02-08T04:41:34Z
dc.date.issued2015-02-24
dc.date.updated2016-02-24T11:18:32Z
dc.description.abstractParticle-In-Cell (PIC) simulations are carried out to investigate the effect of discharge length (L) and pressure (p) on Electron Energy Probability Function (EEPF) in a low pressure radio frequency (rf) inductively coupled plasma (ICP) at 13.56 MHz. It is found that for both cases of varying L (0.1–0.5 m) and p (1–10 mTorr), the EEPF is a bi-Maxwellian with a step in the bounded direction (x) and non-Maxwellian with a hot tail in the symmetric unbounded directions (y, z). The plasma space potential decreases with increase in both L and p, the trapped electrons having energies in the range 0–20 eV. In a conventional discharge bounded in all directions, we infer that L and p are similarity parameters for low energy electrons trapped in the bulk plasma that have energies below the plasma space potential (eVp). The simulation results are consistent with a particle balance model.
dc.identifier.issn2296-424Xen_AU
dc.identifier.urihttp://hdl.handle.net/1885/97979
dc.publisherFrontiers Research Foundation
dc.rights© 2015 Chatterjee, Bhattacharjee, Charles and Boswell. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.
dc.sourceFrontiers in Physics
dc.titleElectron energy probability function and L-p similarity in low pressure inductively coupled bounded plasma
dc.typeJournal article
local.bibliographicCitation.issue7
local.bibliographicCitation.lastpage9
local.bibliographicCitation.startpage1
local.contributor.affiliationChatterjee, Sanghamitro, Indian Institute of Technology Kanpur, Indiaen_AU
local.contributor.affiliationBhattacharjee, Sudeep, Indian Institute of Technology - Kanpur, Indiaen_AU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National Universityen_AU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National Universityen_AU
local.contributor.authoruidCharles, Christine, u4025692
local.contributor.authoruidBoswell, Roderick, u8000743
local.description.notesImported from ARIESen_AU
local.identifier.absfor020204en_AU
local.identifier.ariespublicationu4695161xPUB154en_AU
local.identifier.citationvolume3en_AU
local.identifier.doi10.3389/fphy.2015.00007en_AU
local.publisher.urlhttp://www.frontiersin.org/en_AU
local.type.statusPublished Versionen_AU

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