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Growth, surface morphology, optical properties and electrical resistivity of e-TiNx (0.4 < x = 0.5) films

Date

Authors

Mangalampalli, S.R.N. Kiran

Krishna, Ghanashyam

Padmanabhan, K.A.

Publisher

Elsevier

Abstract

The growth, structure, surface morphology, optical properties and electrical resistivity studies on TiNx (0.4 < x ≤ 0.5) films is presented. The films of thickness 116-230 nm were grown on fused silica substrates by RF magnetron sputtering in 100% pure

Keywords

Keywords: Absorption; Crystallite size; Electric network analysis; Electric resistance; Fused silica; Growth (materials); Light refraction; Magnetron sputtering; Magnetrons; Nanocrystalline alloys; Nitrides; Optical materials; Optical properties; Organic polymers; Optical properties; RF magnetron sputtering; Titanium nitride

URI

http://hdl.handle.net/1885/67125

Collections

ANU Research Publications

Source

Applied Surface Science

Type

Journal article

DOI

10.1016/j.apsusc.2008.06.122

Restricted until

2037-12-31

Downloads

File

Description

01_Mangalampalli_Growth,_surface_morphology,_2008.pdf (1.15 MB)