Amorphization of Cu nanoparticles: effects on surface plasmon resonance

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dc.contributor.authorAmekura, H
dc.contributor.authorJohannessen, B
dc.contributor.authorSprouster, D. J
dc.contributor.authorRidgway, M. C
dc.date.accessioned2015-09-17T23:33:41Z
dc.date.available2015-09-17T23:33:41Z
dc.date.issued2011-07-25
dc.date.updated2016-02-24T08:24:27Z
dc.description.abstractCrystalline copper nanoparticles (NPs) were formed in silica by multi-energy MeV ion implantations and then transformed to amorphous NPs by irradiation with 5 MeV Sn3+ ions. Optical absorptionspectra of both the phases were evaluated in the ultra-violet to near-infrared regions. Compared with corresponding crystalline NPs of the same mean diameter, the amorphous NPs showed a low-energy shift of the surface plasmon resonance around 2.2 eV and less prominent absorptionstructure around 4 eV. These differences are explained by a strongly reduced electron mean-free-path in the amorphous NPs due to the loss of lattice periodicity.
dc.format4 pages
dc.identifier.issn0003-6951en_AU
dc.identifier.urihttp://hdl.handle.net/1885/15539
dc.publisherAmerican Institute of Physics
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/0003-6951..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 18/09/15). Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at https://dx.doi.org/10.1063/1.3615307.
dc.sourceApplied Physics Letters
dc.subjectKeywords: Absorption structure; Copper nanoparticles; Cu nanoparticles; Electron mean-free path; Lattice periodicity; Low energies; Mean diameter; Near infrared region; Ultra-violet; Absorption; Crystalline materials; Electron energy loss spectroscopy; Ion implanta
dc.titleAmorphization of Cu nanoparticles: effects on surface plasmon resonance
dc.typeJournal article
dcterms.dateAccepted2011-07-02
local.bibliographicCitation.issue4en_AU
local.bibliographicCitation.startpage043102en_AU
local.contributor.affiliationAmekura, H, National Institute for Materials Science, Japanen_AU
local.contributor.affiliationJohannessen, B, Australian Synchrotron, Australiaen_AU
local.contributor.affiliationSprouster, David, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National Universityen_AU
local.contributor.affiliationRidgway, Mark C, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National Universityen_AU
local.contributor.authoruidu4301091en_AU
local.description.notesImported from ARIESen_AU
local.identifier.absfor020406en_AU
local.identifier.absfor100712en_AU
local.identifier.absseo970102en_AU
local.identifier.ariespublicationf2965xPUB2296en_AU
local.identifier.citationvolume99en_AU
local.identifier.doi10.1063/1.3615307en_AU
local.identifier.scopusID2-s2.0-79961052304
local.identifier.thomsonID000293475500057
local.identifier.uidSubmittedByu3488905en_AU
local.publisher.urlhttps://www.aip.org/en_AU
local.type.statusPublished Versionen_AU

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