Understanding modes of negative differential resistance in amorphous and polycrystalline vanadium oxides

dc.contributor.authorNandi, Sanjoy
dc.contributor.authorDas, Sujan
dc.contributor.authorEstherby, Caleb
dc.contributor.authorGentle, Angus
dc.contributor.authorElliman, Robert
dc.date.accessioned2023-07-05T23:41:11Z
dc.date.available2023-07-05T23:41:11Z
dc.date.issued2020
dc.date.updated2022-04-24T08:16:17Z
dc.description.abstractMetal-oxide-metal devices based on amorphous VOx are shown to exhibit one of two distinct negative differential resistance (NDR) characteristics depending on the maximum current employed for electroforming. For low compliance currents they exhibit a smooth S-type characteristic and have a temperature-dependent device resistance characterized by an activation energy of 0.25eV, consistent with conduction in polycrystalline VO2, while for high compliance currents they exhibit an abrupt snap-back characteristic and a resistance characterized by an activation energy of 0.025eV, consistent with conduction in oxygen deficient VOx. In both cases, the temperature dependence of the switching voltage implies that the conductivity change is due to the insulator-metal transition in VO2. From this analysis, it is concluded that electroforming at low currents creates a conductive filament comprised largely of polycrystalline VO2, while electroforming at high currents creates a composite structure comprised of VO2 and a conductive halo of oxygen deficient VOx. The effect of electroforming on the NDR mode is then explained with reference to a lumped element model of filamentary conduction that includes the effect of a parallel resistance created by the halo. These results provide new insight into the NDR response of vanadium-oxide-based devices and a basis for designing devices with specific characteristics.en_AU
dc.description.sponsorshipThis work was partly funded by the Australian Research Council (ARC) and Varian Semiconductor Equipment/Applied Materials through an ARC Linkage Project Grant (No. LP150100693).en_AU
dc.format.mimetypeapplication/pdfen_AU
dc.identifier.issn0021-8979en_AU
dc.identifier.urihttp://hdl.handle.net/1885/293992
dc.language.isoen_AUen_AU
dc.provenancehttps://v2.sherpa.ac.uk/id/publication/9867..."The Published Version can be archived in Institutional Repository. 12 months embargo" from SHERPA/RoMEO site (as at 6/07/2023). This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (Nandi, Sanjoy Kumar, et al. "Understanding modes of negative differential resistance in amorphous and polycrystalline vanadium oxides." Journal of Applied Physics 128.24 (2020)." and may be found at https://dx.doi.org/10.1063/5.0027875en_AU
dc.publisherAmerican Institute of Physics (AIP)en_AU
dc.relationhttp://purl.org/au-research/grants/arc/LP150100693en_AU
dc.rights© 2020 Author(s).en_AU
dc.sourceJournal of Applied Physicsen_AU
dc.titleUnderstanding modes of negative differential resistance in amorphous and polycrystalline vanadium oxidesen_AU
dc.typeJournal articleen_AU
dcterms.accessRightsOpen Accessen_AU
local.bibliographicCitation.issue24en_AU
local.bibliographicCitation.lastpage244103-7en_AU
local.bibliographicCitation.startpage244103-1en_AU
local.contributor.affiliationNandi, Sanjoy, College of Science, ANUen_AU
local.contributor.affiliationDas, Sujan, College of Science, ANUen_AU
local.contributor.affiliationEstherby, Caleb, University of Technology Sydneyen_AU
local.contributor.affiliationGentle, Angus, University of Technology Sydneyen_AU
local.contributor.affiliationElliman, Rob, College of Science, ANUen_AU
local.contributor.authoruidNandi, Sanjoy, u4939839en_AU
local.contributor.authoruidDas, Sujan, u7069089en_AU
local.contributor.authoruidElliman, Rob, u9012877en_AU
local.description.notesImported from ARIESen_AU
local.identifier.absfor401600 - Materials engineeringen_AU
local.identifier.absseo280120 - Expanding knowledge in the physical sciencesen_AU
local.identifier.ariespublicationa383154xPUB17096en_AU
local.identifier.citationvolume128en_AU
local.identifier.doi10.1063/5.0027875en_AU
local.identifier.scopusID2-s2.0-85099176419
local.identifier.thomsonIDWOS:000603052700001
local.publisher.urlhttps://pubs.aip.org/en_AU
local.type.statusPublished Versionen_AU

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