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Patterning of hafnia and titania via gas-phase soft lithography combined with atomic layer deposition

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Date

2013

Authors

Notley, Shannon
Fogden, Andrew

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier

Abstract

Novel titania and hafnia structures on top of silica wafer were produced using atomic layer deposition through the accessible pores created by a patterned polydimethylsiloxane (PDMS) stamp in conformal contact. Typically, the processing temperature was in

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Keywords

Citation

URI

http://hdl.handle.net/1885/75440

Collections

ANU Research Publications

Source

Applied Surface Science

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1016/j.apsusc.2013.08.040

Restricted until

2037-12-31

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01_Notley_Patterning_of_hafnia_and_2013.pdf (1.58 MB)

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