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Mechanical properties of ZnO epitaxial layers grown on a- and c-axis sapphire

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Authors

Coleman, Victoria A
Bradby, J. E.
Jagadish, C.
Munroe, P.
Heo, Y. W.
Pearton, S. J.
Norton, D P
Inoue, M.
Yano, M.

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American Institute of Physics

Abstract

The mechanical properties of zinc oxide epitaxial layers grown on a- and c-axis sapphire have been studied by spherical nanoindentation and cross-sectional transmission electron microscopy. As-grown threading dislocations, which are characteristic of epitaxialmaterial, combined with the presence of the much harder, underlying substrate are found to have a significant effect on the mechanical behavior of ZnO epilayers as compared to bulk material. Epilayer material is found to be significantly harder than its bulk counterpart. For a-axis epilayers, analysis of load–unload data yields a hardness of 6.6±1.2GPa, and 5.75±0.8GPa for c-axis layers. We attribute this increased hardness to strain compensation via the presence of as-grown defects. These defects inhibit the slip mechanism responsible for relative softness of bulk single crystals. The absence of pop-in events from analyzed continuous-load nanoindentation data is further evidence for strain compensation by native defects within the epilayers. Large variations in the spread of collected data are indicative of inhomegenity in the epilayers.

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Applied Physics Letters

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