Resistance switching in polycrystalline NiOx thin film

Date

Authors

Kim, Tae-Hyun
Nawaz (Saleh), Muhammad
Kim, Sung-I
Venkatachalam, Dinesh
Belay, Kidane
Burgess, Andrew
Strumpp, Stephan
Elliman, Robert

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Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

Resistive switching properties of polycrystalline NiOx dielectric films are investigated utilizing thermo-chemical model in which a field-induced conductive filament is formed and broken by joule heating.

Description

Citation

Source

2010 conference on Optoelectronic and Microelectronic Materials and Devices Proceedings

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Restricted until

2037-12-31