Very low loss reactively ion etched Tellurium Dioxide planar rib waveguides for linear and non-linear optics

dc.contributor.authorMadden, Steve
dc.contributor.authorVu, K
dc.date.accessioned2009-11-09T01:23:12Zen_US
dc.date.accessioned2010-12-20T06:05:20Z
dc.date.available2009-11-09T01:23:12Zen_US
dc.date.available2010-12-20T06:05:20Z
dc.date.issued2009-09-17en_US
dc.date.updated2015-12-09T09:52:56Z
dc.description.abstractWe report on the fabrication and optical properties of the first very low loss nonlinear Tellurite planar rib waveguides ever demonstrated. A new reactive ion etch process based on Hydrogen as the active species was developed to accomplish the low propagation losses. Optical losses below ~0.05dB/cm in most of the NIR spectrum and ~0.10dB/cm at 1550nm have been achieved - the lowest ever reported by more than an order of magnitude and clearly suitable for planar integrated devices. We demonstrate strong spectral broadening of 0.6ps pulses in waveguides fabricated from pure TeO2, in good agreement with simulations.
dc.format7 pages
dc.identifier.citationOptics Express 17.20 (2009): 17645-17651
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://hdl.handle.net/10440/993en_US
dc.identifier.urihttp://digitalcollections.anu.edu.au/handle/10440/993
dc.publisherOptical Society of America
dc.rightsOptics Express is available free to readers via the Web.
dc.rights"OSA will grant the authors permission to deposit the publisher’s pdf from their Optics Express articles into the repository with the proper citation (reference number or journal /volume/page/year citation)." - from email received from Authorized Agent, The Optical Society, 27/05/10
dc.sourceOptics Express
dc.source.urihttp://www.opticsinfobase.org/viewmedia.cfm?uri=oe-17-20-17645&seq=0en_US
dc.subjectoptical communications
dc.subjectnonlinear optical signal processing
dc.subjectintegrated optics devices
dc.titleVery low loss reactively ion etched Tellurium Dioxide planar rib waveguides for linear and non-linear optics
dc.typeJournal article
dcterms.dateAccepted2009-09-09en_US
local.bibliographicCitation.issue20
local.bibliographicCitation.startpage17645
local.contributor.affiliationMadden, Steve, Research School of Physical Sciences and Engineering, Laser Physics Centreen_US
local.contributor.affiliationVu, K, Research School of Physical Sciences and Engineering, Laser Physics Centreen_US
local.contributor.authoruidu4151700en_US
local.contributor.authoruidu2515789en_US
local.identifier.absfor090606en_US
local.identifier.ariespublicationu9912193xPUB308en_US
local.identifier.citationvolume17
local.identifier.doi10.1364/OE.17.017645
local.identifier.scopusID2-s2.0-70349694739
local.identifier.uidSubmittedByu8402810en_US
local.type.statusPublished Versionen_US

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