Low-loss Silica-based Optical Film Waveguides Deposited by Helicon-activated Reactive Evaporation
Planar silica-based optical waveguides have been deposited by a plasma helicon-activated reactive evaporation system, at a low temperature and with reduced hydrogen contamination, on thermally oxidized silicon wafers. The transmission loss of the rib waveguides, formed on the deposited films by etching with hydrofluoric acid, is determined to be lower than 0.1 and 0.7 dB/cm at wavelengths of 1310 and 1510 nm, respectively, for TE polarization. The influence of substrate leakage on propagation...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Lightwave Technology|
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