Selective placement of quantum dots on nanoscale areas of metal-free substrates
We demonstrate a novel approach for selectively immobiliz-ing semiconductor core-shell quantum dots directly on metal-free substrates with nanoscale resolution. This is accomplished by defining a mask via electron-beam lithography (EBL) followed by the functionalization of only the exposed areas of the substrate with quantum dots using a heterobi-functional linker. Non-specific binding is suppressed by a binding inhibitor. (
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|Source:||Physica Status Solidi: Rapid Research Letters|
|01_Staude_Selective_placement_of_quantum_2014.pdf||397.78 kB||Adobe PDF||Request a copy|
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