Plasma-Enhanced Chemical Vapour Deposition of a-Si:H to Provide Surface Passivation of c-Si Surfaces at Low Temperature

dc.contributor.author	Mitchell, Jonathon
dc.contributor.author	MacDonald, Daniel
dc.contributor.author	Cuevas, Andres
dc.coverage.spatial	Milan Italy
dc.date.accessioned	2015-12-10T22:30:19Z
dc.date.created	September 3-7 2007
dc.identifier.uri	http://hdl.handle.net/1885/55046
dc.publisher	WIP-Renewable Energies
dc.relation.ispartofseries	European Photovoltaic Solar Energy Conference 2007
dc.source	Proceedings of the European Photovoltaic Solar Energy Conference
dc.title	Plasma-Enhanced Chemical Vapour Deposition of a-Si:H to Provide Surface Passivation of c-Si Surfaces at Low Temperature
dc.type	Conference paper
local.description.notes	Imported from ARIES
local.description.refereed	Yes
dc.date.issued	2007
local.identifier.absfor	091299 - Materials Engineering not elsewhere classified
local.identifier.ariespublication	u4251866xPUB317
local.type.status	Published Version
local.contributor.affiliation	Mitchell, Jonathon, College of Engineering and Computer Science, ANU
local.contributor.affiliation	MacDonald, Daniel, College of Engineering and Computer Science, ANU
local.contributor.affiliation	Cuevas, Andres, College of Engineering and Computer Science, ANU
local.description.embargo	2037-12-31
local.bibliographicCitation.startpage	4
local.identifier.absseo	850504 - Solar-Photovoltaic Energy
dc.date.updated	2015-12-09T10:00:55Z
Collections	ANU Research Publications

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