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Impurity-free vacancy disordering of quantum heterostructures with SiOxNy encapsulants deposited by magnetron sputtering

McKerracher, Ian; Fu, Lan; Jagadish, Chennupati; Tan, Hark Hoe

Description

Post-growth techniques such as impurity-free vacancy disordering (IFVD) are simple and effective avenues to monolithic integration of optoelectonic components. Sputter deposition of encapsulant films can enhance quantum well intermixing through IFVD and an additional mechanism involving surface damage during the sputtering process. In this study, these two mechanisms were compared in a multi-quantum well structure. The compositions of different silicon oxy-nitride films were controlled by...[Show more]

CollectionsANU Research Publications
Date published: 2008
Type: Conference paper
URI: http://hdl.handle.net/1885/39134
Source: PROCEEDINGS OF SPIE, Volume 7039 Nanoengineering: Fabrication, Properties, Optics, and Devices V
DOI: 10.1117/12.793568

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