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Grounded radio-frequency electrodes in contact with high density plasmas

Aanesland, Ane; Charles, C.; Boswell, R. W.; Lieberman, M. A.

Description

An analytical model is developed of an asymmetric electrode system immersed in a plasma, consisting of two dc-grounded electrodes, where the smaller one is biased at 13.56MHz. The model is compared with a set of experiments performed in a high density low pressure plasma source (an electron cyclotron resonance source) where a second electrode is immersed into the plasma and powered by radio frequency. Excellent agreement is obtained between the analytical model and the experimental results. It...[Show more]

dc.contributor.authorAanesland, Ane
dc.contributor.authorCharles, C.
dc.contributor.authorBoswell, R. W.
dc.contributor.authorLieberman, M. A.
dc.date.accessioned2015-10-01T04:57:12Z
dc.date.available2015-10-01T04:57:12Z
dc.identifier.issn1070-664X
dc.identifier.urihttp://hdl.handle.net/1885/15749
dc.description.abstractAn analytical model is developed of an asymmetric electrode system immersed in a plasma, consisting of two dc-grounded electrodes, where the smaller one is biased at 13.56MHz. The model is compared with a set of experiments performed in a high density low pressure plasma source (an electron cyclotron resonance source) where a second electrode is immersed into the plasma and powered by radio frequency. Excellent agreement is obtained between the analytical model and the experimental results. It is found that the time average plasma potential and the direct current(dc) flowing in the system during steady state are strongly dependent on both the rf voltage (or power) and the area ratio between the larger and smaller electrodes. For area ratios larger than 80, the dc current is large and the plasma potential is constant with respect to the applied rf voltage. For area ratios smaller than 80 but larger than unity, the plasma potential increases linearly with the applied rf voltage, and the dc current is reduced compared to the large area ratio case.
dc.publisherAmerican Institute of Physics
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/1070-664X..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 1/10/15). Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Physics of Plasmas and may be found at https://doi.org/10.1063/1.2089227"
dc.sourcePhysics of Plasmas
dc.subjectKeywords: Dc-grounded electrodes; Direct current (dc); Rf voltage; Steady state; Cyclotron resonance; DC machinery; Electric potential; Mathematical models; Plasmas; Radio frequency amplifiers; Grounding electrodes
dc.titleGrounded radio-frequency electrodes in contact with high density plasmas
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume12
dc.date.issued2005-10-17
local.identifier.absfor020204
local.identifier.ariespublicationMigratedxPub11420
local.publisher.urlhttps://www.aip.org/
local.type.statusPublished Version
local.contributor.affiliationAanesland, Ane, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationLieberman, M.A., University of California, United States of America
local.bibliographicCitation.issue10
local.bibliographicCitation.startpage103505
local.bibliographicCitation.lastpage7
local.identifier.doi10.1063/1.2089227
dc.date.updated2015-12-12T07:19:35Z
local.identifier.scopusID2-s2.0-27644586722
CollectionsANU Research Publications

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