Effect of side wall roughness in buried channel waveguides
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Ladouceur, F.
Love, J. D.
Senden, T. J.
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Abstract
An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.
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IEE Proceedings: Optoelectronics
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