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Characterization of silicon / silicon dioxide / LPCVD silicon nitride stacks for solar cell application

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dc.contributor.authorJin, Hao
dc.date.accessioned2018-09-04T03:34:43Z
dc.date.available2018-09-04T03:34:43Z
dc.date.copyright2007
dc.date.issued2007
dc.date.updated2018-08-30T00:17:13Z
dc.format.extent[8], 196 p.
dc.identifier.otherb2353153
dc.identifier.urihttp://hdl.handle.net/1885/147115
dc.language.isoen_AUen_AU
dc.subject.lccTK2960.J56 2007
dc.subject.lcshSolar cells
dc.subject.lcshSilicon
dc.subject.lcshSilicon nitride
dc.subject.lcshThin films
dc.titleCharacterization of silicon / silicon dioxide / LPCVD silicon nitride stacks for solar cell applicationen_AU
dc.typeThesis (PhD)en_AU
dcterms.valid2007en_AU
local.description.notesThesis (Ph.D.)--Australian National University, 2007
local.identifier.doi10.25911/5d63c0eaaa2cb
local.mintdoimint
local.type.degreeDoctor of Philosophy (PhD)en_AU

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