Cultural advice

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.

Aboriginal and Torres Strait Islander peoples are advised that ANU Library collections may include images, names, voices, and other representations of deceased persons.

Material in the collection may contain terms, language or views that reflect the period in which the item was created and may be considered inappropriate today.

Film stress in silicon dioxide deposited by helicon activated reactive evaporation

Simple item page
dc.contributor.authorAu, Vicky
dc.date.accessioned2018-11-22T00:08:46Z
dc.date.available2018-11-22T00:08:46Z
dc.date.copyright2005
dc.date.issued2005
dc.date.updated2018-11-21T11:53:44Z
dc.format.extentxviii, 166 p.
dc.identifier.otherb2278362
dc.identifier.urihttp://hdl.handle.net/1885/151642
dc.language.isoen_AUen_AU
dc.rightsAuthor retains copyrighten_AU
dc.subject.lccQC611.8.A5A9 2005
dc.subject.lcshSilica
dc.subject.lcshAmorphous substances
dc.subject.lcshThin films
dc.subject.lcshPlasma-enhanced chemical vapor deposition
dc.titleFilm stress in silicon dioxide deposited by helicon activated reactive evaporation
dc.typeThesis (PhD)en_AU
dcterms.accessRightsOpen Accessen_AU
local.description.notesThesis (Ph.D.)--Australian National University, 2005en_AU
local.identifier.doi10.25911/5d515310b4144
local.mintdoimint
local.type.statusAccepted Versionen_AU

Downloads

Original bundle

Now showing 1 - 1 of 1
Thumbnail Image
Name:
b22783623-Au_V.pdf
Size:
306.87 MB
Format:
Adobe Portable Document Format
Download

Collections

Open Access Theses

DSpace software copyright © 2002-2026 LYRASIS