Comparison of quantum well intermixing in InGaAsP/InGaAs and A1InGaAs/InGaAs materials and devices
dc.contributor.author | Du, Sichao | |
dc.date.accessioned | 2018-11-22T00:06:33Z | |
dc.date.available | 2018-11-22T00:06:33Z | |
dc.date.copyright | 2008 | |
dc.date.issued | 2008 | |
dc.date.updated | 2018-11-21T03:23:58Z | |
dc.format.extent | xii, 73 leaves | |
dc.identifier.other | b2381377 | |
dc.identifier.uri | http://hdl.handle.net/1885/150770 | |
dc.language.iso | en_AU | en_AU |
dc.rights | Author retains copyright | en_AU |
dc.subject.lcc | QC176.8.Q35 D8 2008 | |
dc.subject.lcsh | Quantum wells | |
dc.subject.lcsh | Ion implantation | |
dc.subject.lcsh | Optoelectronic devices | |
dc.title | Comparison of quantum well intermixing in InGaAsP/InGaAs and A1InGaAs/InGaAs materials and devices | |
dc.type | Thesis (MPhil) | en_AU |
dcterms.accessRights | Open Access | en_AU |
local.description.notes | Thesis (M. Phil.)--Australian National University, 2008 | |
local.identifier.doi | 10.25911/5d5154bf522fc | |
local.mintdoi | mint | |
local.type.status | Accepted Version | en_AU |
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