Fabrication of submicron structures in nanoparticle/polymer composite by holographic lithography and reactive ion etching
We report on the fabrication of nanoparticle/polymer submicron structures by combining holographic lithography and reactive ion etching. Silica nanoparticles are uniformly dispersed in a (SU8) polymer matrix at a high concentration, and in situ polymerization (cross-linking) is used to form a nanoparticle/polymer composite. Another photosensitive SU8 layer cast upon the nanoparticle/SU8 composite layer is structured through holographic lithography, whose pattern is finally transferred to the...[Show more]
|Collections||ANU Research Publications|
|Source:||Applied Physics Letters|
|Zhang et al Fabrication of Submicron 2008.pdf||1.14 MB||Adobe PDF|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.