InGaAs Quantum Dots Grown with GaP Strain Compensation Layers
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Lever McGowan, Penelope; Jagadish, Chennupati; Tan, Hark Hoe
Description
The use of GaP as a strain compensation layer was studied. The GaP layers were in tensile strain with respect to GaAs, with a lattice mismatch of 4%, whereas the In0.5Ga0.5As dots were in compressive strain. The samples were grown using a low-pressure horizontal flow metalorganic chemical vapor deposition (MOCVD) reactor. It was found that the density of dots in the top layer of the stack is increased as the GaP layer is deposited closer to the dot layer.
dc.contributor.author | Lever McGowan, Penelope | |
---|---|---|
dc.contributor.author | Jagadish, Chennupati | |
dc.contributor.author | Tan, Hark Hoe | |
dc.date.accessioned | 2015-12-13T22:37:30Z | |
dc.identifier.issn | 0021-8979 | |
dc.identifier.uri | http://hdl.handle.net/1885/77128 | |
dc.description.abstract | The use of GaP as a strain compensation layer was studied. The GaP layers were in tensile strain with respect to GaAs, with a lattice mismatch of 4%, whereas the In0.5Ga0.5As dots were in compressive strain. The samples were grown using a low-pressure horizontal flow metalorganic chemical vapor deposition (MOCVD) reactor. It was found that the density of dots in the top layer of the stack is increased as the GaP layer is deposited closer to the dot layer. | |
dc.publisher | American Institute of Physics (AIP) | |
dc.source | Journal of Applied Physics | |
dc.subject | Keywords: Annealing; Atomic force microscopy; Interdiffusion (solids); Metallorganic chemical vapor deposition; Nucleation; Photodetectors; Photoluminescence; Semiconducting gallium compounds; Semiconducting indium gallium arsenide; Strain; Surface roughness; Therm | |
dc.title | InGaAs Quantum Dots Grown with GaP Strain Compensation Layers | |
dc.type | Journal article | |
local.description.notes | Imported from ARIES | |
local.description.refereed | Yes | |
local.identifier.citationvolume | 95 | |
dc.date.issued | 2004 | |
local.identifier.absfor | 100799 - Nanotechnology not elsewhere classified | |
local.identifier.absfor | 091299 - Materials Engineering not elsewhere classified | |
local.identifier.ariespublication | MigratedxPub6013 | |
local.type.status | Published Version | |
local.contributor.affiliation | Lever McGowan, Penelope, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Tan, Hoe Hark, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Jagadish, Chennupati, College of Physical and Mathematical Sciences, ANU | |
local.description.embargo | 2037-12-31 | |
local.bibliographicCitation.issue | 10 | |
local.bibliographicCitation.startpage | 5710 | |
local.bibliographicCitation.lastpage | 5714 | |
local.identifier.doi | 10.1063/1.1707230 | |
dc.date.updated | 2015-12-11T09:36:59Z | |
local.identifier.scopusID | 2-s2.0-2942521387 | |
Collections | ANU Research Publications |
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