Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate
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Brault, Pascal; Josserand, Christophe; Bauchire, Jean-Marc; Caillard, A.; Charles, Christine; Boswell, Roderick
Description
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
dc.contributor.author | Brault, Pascal | |
---|---|---|
dc.contributor.author | Josserand, Christophe | |
dc.contributor.author | Bauchire, Jean-Marc | |
dc.contributor.author | Caillard, A. | |
dc.contributor.author | Charles, Christine | |
dc.contributor.author | Boswell, Roderick | |
dc.date.accessioned | 2015-12-07T22:14:18Z | |
dc.identifier.issn | 0031-9007 | |
dc.identifier.uri | http://hdl.handle.net/1885/17356 | |
dc.description.abstract | Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time. | |
dc.publisher | American Physical Society | |
dc.source | Physical Review Letters | |
dc.subject | Keywords: Atomic physics; Atoms; Nonlinear equations; Porous materials; Anomalous diffusions; Atom depositions; Atomic diffusions; Diffusion equations; Diffusion profiles; Dynamic controls; Porous mediums; Porous substrates; Rescaling; Scaling analysis; Time-depend | |
dc.title | Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate | |
dc.type | Journal article | |
local.description.notes | Imported from ARIES | |
local.identifier.citationvolume | 012 | |
dc.date.issued | 2009 | |
local.identifier.absfor | 100706 - Nanofabrication, Growth and Self Assembly | |
local.identifier.absfor | 020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges | |
local.identifier.absfor | 030307 - Theory and Design of Materials | |
local.identifier.ariespublication | u4735977xPUB1 | |
local.type.status | Published Version | |
local.contributor.affiliation | Brault, Pascal, Universite d'Orleans | |
local.contributor.affiliation | Josserand, Christophe , Institut Jean Le Rond d'Alembert | |
local.contributor.affiliation | Bauchire, Jean-Marc, CNRS | |
local.contributor.affiliation | Caillard, A., Universite d'Orleans | |
local.contributor.affiliation | Charles, Christine, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Boswell, Roderick, College of Physical and Mathematical Sciences, ANU | |
local.bibliographicCitation.issue | 4 (2009) | |
local.bibliographicCitation.startpage | 045901 | |
local.bibliographicCitation.lastpage | 4 | |
local.identifier.doi | 10.1103/PhysRevLett.102.045901 | |
dc.date.updated | 2016-02-24T11:22:10Z | |
local.identifier.scopusID | 2-s2.0-60449116850 | |
local.identifier.thomsonID | 000262978600039 | |
Collections | ANU Research Publications |
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