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Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate

Brault, Pascal; Josserand, Christophe; Bauchire, Jean-Marc; Caillard, A.; Charles, Christine; Boswell, Roderick

Description

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

dc.contributor.authorBrault, Pascal
dc.contributor.authorJosserand, Christophe
dc.contributor.authorBauchire, Jean-Marc
dc.contributor.authorCaillard, A.
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Roderick
dc.date.accessioned2015-12-07T22:14:18Z
dc.identifier.issn0031-9007
dc.identifier.urihttp://hdl.handle.net/1885/17356
dc.description.abstractConstant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
dc.publisherAmerican Physical Society
dc.sourcePhysical Review Letters
dc.subjectKeywords: Atomic physics; Atoms; Nonlinear equations; Porous materials; Anomalous diffusions; Atom depositions; Atomic diffusions; Diffusion equations; Diffusion profiles; Dynamic controls; Porous mediums; Porous substrates; Rescaling; Scaling analysis; Time-depend
dc.titleAnomalous Diffusion Mediated by Atom Deposition into a Porous Substrate
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume012
dc.date.issued2009
local.identifier.absfor100706 - Nanofabrication, Growth and Self Assembly
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.absfor030307 - Theory and Design of Materials
local.identifier.ariespublicationu4735977xPUB1
local.type.statusPublished Version
local.contributor.affiliationBrault, Pascal, Universite d'Orleans
local.contributor.affiliationJosserand, Christophe , Institut Jean Le Rond d'Alembert
local.contributor.affiliationBauchire, Jean-Marc, CNRS
local.contributor.affiliationCaillard, A., Universite d'Orleans
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.bibliographicCitation.issue4 (2009)
local.bibliographicCitation.startpage045901
local.bibliographicCitation.lastpage4
local.identifier.doi10.1103/PhysRevLett.102.045901
dc.date.updated2016-02-24T11:22:10Z
local.identifier.scopusID2-s2.0-60449116850
local.identifier.thomsonID000262978600039
CollectionsANU Research Publications

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